The Performance of FRAM Integrated With 3D Trench Hf0.5Zr0.5O2 Ferroelectric Capacitor

Jianjun Li, Tao Du, Wei Li. The Performance of FRAM Integrated With 3D Trench Hf0.5Zr0.5O2 Ferroelectric Capacitor. In International Conference on IC Design and Technology, ICICDT 2023, Tokyo, Japan, September 25-28, 2023. pages 124-126, IEEE, 2023. [doi]

Abstract

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