Process variation dependence of total ionizing dose effects in bulk nFinFETs

Bo Li 0051, Yunbo Huang, Ling Yang, Qingzhu Zhang, Zhongshan Zheng, Binhong Li, Huiping Zhu, J. H. Bu, Huaxiang Yin, Jiajun Luo, Zhengsheng Han, Haibin Wang. Process variation dependence of total ionizing dose effects in bulk nFinFETs. Microelectronics Reliability, 88:946-951, 2018. [doi]

Abstract

Abstract is missing.