Simon C. Li, J. P. Su, T. H. Wu, J. M. Lee, M. F. Shu. Dielectric tunnel parameters of CoFe/Al-O/CoFe in MTJ for 1T1MTJ MRAM applications. In 13th IEEE International Workshop on Memory Technology, Design, and Testing (MTDT 2005), 3-5 August 2005, Taipei, Taiwan. pages 29-34, IEEE Computer Society, 2005. [doi]
@inproceedings{LiSWLS05,
title = {Dielectric tunnel parameters of CoFe/Al-O/CoFe in MTJ for 1T1MTJ MRAM applications},
author = {Simon C. Li and J. P. Su and T. H. Wu and J. M. Lee and M. F. Shu},
year = {2005},
doi = {10.1109/MTDT.2005.20},
url = {http://doi.ieeecomputersociety.org/10.1109/MTDT.2005.20},
researchr = {https://researchr.org/publication/LiSWLS05},
cites = {0},
citedby = {0},
pages = {29-34},
booktitle = {13th IEEE International Workshop on Memory Technology, Design, and Testing (MTDT 2005), 3-5 August 2005, Taipei, Taiwan},
publisher = {IEEE Computer Society},
isbn = {0-7695-2313-7},
}