Numerical Characterization of a 5-Layer (Pt/Ta/TaO/AlO/W) RRAM Device

Jiahao Li, Wanlan Yang, Xing Zhou. Numerical Characterization of a 5-Layer (Pt/Ta/TaO/AlO/W) RRAM Device. In 15th IEEE International Conference on ASIC, ASICON 2023, Nanjing, China, October 24-27, 2023. pages 1-4, IEEE, 2023. [doi]

Abstract

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