Interconnect fabrication processes and the development of low-cost wiring for CMOS products

Thomas J. Licata, Evan G. Colgan, James M. E. Harper, Stephen E. Luce. Interconnect fabrication processes and the development of low-cost wiring for CMOS products. IBM Journal of Research and Development, 39(4):419-436, 1995.

@article{LicataCHL95,
  title = {Interconnect fabrication processes and the development of low-cost wiring for CMOS products},
  author = {Thomas J. Licata and Evan G. Colgan and James M. E. Harper and Stephen E. Luce},
  year = {1995},
  tags = {e-science},
  researchr = {https://researchr.org/publication/LicataCHL95},
  cites = {0},
  citedby = {0},
  journal = {IBM Journal of Research and Development},
  volume = {39},
  number = {4},
  pages = {419-436},
}