Interconnect and current density stress: an introduction to electromigration-aware design

Jens Lienig. Interconnect and current density stress: an introduction to electromigration-aware design. In Igor L. Markov, Mike Hutton, editors, The Seventh International Workshop on System-Level Interconnect Prediction (SLIP 2005), San Francisco, CA, USA, April 2-3, 2005, Proceedings. pages 81-88, ACM, 2005. [doi]

Abstract

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