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Patterning Aware Design Optimization of Selective Etching in N5 and Beyond

Yibo Lin, Peter Debacker, Darko Trivkovic, Ryoung-Han Kim, Praveen Raghavan, David Z. Pan. Patterning Aware Design Optimization of Selective Etching in N5 and Beyond. In 2017 IEEE International Conference on Computer Design, ICCD 2017, Boston, MA, USA, November 5-8, 2017. pages 415-418, IEEE Computer Society, 2017. [doi]

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