Double patterning lithography aware gridless detailed routing with innovative conflict graph

Yen-Hung Lin, Yih-Lang Li. Double patterning lithography aware gridless detailed routing with innovative conflict graph. In Sachin S. Sapatnekar, editor, Proceedings of the 47th Design Automation Conference, DAC 2010, Anaheim, California, USA, July 13-18, 2010. pages 398-403, ACM, 2010. [doi]

Authors

Yen-Hung Lin

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Yih-Lang Li

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