Yen-Hung Lin, Yih-Lang Li. Double patterning lithography aware gridless detailed routing with innovative conflict graph. In Sachin S. Sapatnekar, editor, Proceedings of the 47th Design Automation Conference, DAC 2010, Anaheim, California, USA, July 13-18, 2010. pages 398-403, ACM, 2010. [doi]
Abstract is missing.