Stitch aware detailed placement for multiple e-beam lithography

Yibo Lin, Bei Yu, Yi Zou, Zhuo Li 0001, Charles J. Alpert, David Z. Pan. Stitch aware detailed placement for multiple e-beam lithography. In 21st Asia and South Pacific Design Automation Conference, ASP-DAC 2016, Macao, Macao, January 25-28, 2016. pages 186-191, IEEE, 2016. [doi]

Authors

Yibo Lin

This author has not been identified. Look up 'Yibo Lin' in Google

Bei Yu

This author has not been identified. Look up 'Bei Yu' in Google

Yi Zou

This author has not been identified. Look up 'Yi Zou' in Google

Zhuo Li 0001

This author has not been identified. Look up 'Zhuo Li 0001' in Google

Charles J. Alpert

This author has not been identified. Look up 'Charles J. Alpert' in Google

David Z. Pan

This author has not been identified. Look up 'David Z. Pan' in Google