Yibo Lin, Bei Yu, Yi Zou, Zhuo Li 0001, Charles J. Alpert, David Z. Pan. Stitch aware detailed placement for multiple e-beam lithography. In 21st Asia and South Pacific Design Automation Conference, ASP-DAC 2016, Macao, Macao, January 25-28, 2016. pages 186-191, IEEE, 2016. [doi]
Abstract is missing.