Overlay-Aware Detailed Routing for Self-Aligned Double Patterning Lithography Using the Cut Process - researchr publication authors

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Iou-Jen Liu, Shao-Yun Fang, Yao-Wen Chang. Overlay-Aware Detailed Routing for Self-Aligned Double Patterning Lithography Using the Cut Process. In The 51st Annual Design Automation Conference 2014, DAC '14, San Francisco, CA, USA, June 1-5, 2014. pages 1-6, ACM, 2014. [doi]

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