Iou-Jen Liu, Shao-Yun Fang, Yao-Wen Chang. Overlay-Aware Detailed Routing for Self-Aligned Double Patterning Lithography Using the Cut Process. In The 51st Annual Design Automation Conference 2014, DAC '14, San Francisco, CA, USA, June 1-5, 2014. pages 1-6, ACM, 2014. [doi]
@inproceedings{LiuFC14,
title = {Overlay-Aware Detailed Routing for Self-Aligned Double Patterning Lithography Using the Cut Process},
author = {Iou-Jen Liu and Shao-Yun Fang and Yao-Wen Chang},
year = {2014},
doi = {10.1145/2593069.2593176},
url = {http://doi.acm.org/10.1145/2593069.2593176},
researchr = {https://researchr.org/publication/LiuFC14},
cites = {0},
citedby = {0},
pages = {1-6},
booktitle = {The 51st Annual Design Automation Conference 2014, DAC '14, San Francisco, CA, USA, June 1-5, 2014},
publisher = {ACM},
isbn = {978-1-4503-2730-5},
}