Ziyuan Liu, Fumihiko Hayashi, Shinji Fujieda, Markus Wilde, Katsuyuki Fukutani. Reliability driven guideline for BEOL Optimization: Protecting MOS stacks from hydrogen-related impurity penetration. In IEEE International Conference on IC Design & Technology, ICICDT 2012, Austin, TX, USA, May 30 - June 1, 2012. pages 1-4, IEEE, 2012. [doi]
Abstract is missing.