Distinguishing Interfacial Hole Traps in (110), (100) High-K Gate Stack

Yueyang Liu, Xiangwei Jiang, Liwei Wang 0003, Yunfei En, Runsheng Wang. Distinguishing Interfacial Hole Traps in (110), (100) High-K Gate Stack. In IEEE International Reliability Physics Symposium, IRPS 2019, Monterey, CA, USA, March 31 - April 4, 2019. pages 1-4, IEEE, 2019. [doi]

@inproceedings{LiuJWEW19,
  title = {Distinguishing Interfacial Hole Traps in (110), (100) High-K Gate Stack},
  author = {Yueyang Liu and Xiangwei Jiang and Liwei Wang 0003 and Yunfei En and Runsheng Wang},
  year = {2019},
  doi = {10.1109/IRPS.2019.8720414},
  url = {https://doi.org/10.1109/IRPS.2019.8720414},
  researchr = {https://researchr.org/publication/LiuJWEW19},
  cites = {0},
  citedby = {0},
  pages = {1-4},
  booktitle = {IEEE International Reliability Physics Symposium, IRPS 2019, Monterey, CA, USA, March 31 - April 4, 2019},
  publisher = {IEEE},
  isbn = {978-1-5386-9504-3},
}