Ning Lu, Bill Dewey. Characterization, simulation, and modeling of FET source/drain diffusion resistance. In Proceedings of the IEEE 2008 Custom Integrated Circuits Conference, CICC 2008, DoubleTree Hotel, San Jose, California, USA, September 21-24, 2008. pages 281-284, IEEE, 2008. [doi]
@inproceedings{LuD08-2,
title = {Characterization, simulation, and modeling of FET source/drain diffusion resistance},
author = {Ning Lu and Bill Dewey},
year = {2008},
doi = {10.1109/CICC.2008.4672076},
url = {http://dx.doi.org/10.1109/CICC.2008.4672076},
researchr = {https://researchr.org/publication/LuD08-2},
cites = {0},
citedby = {0},
pages = {281-284},
booktitle = {Proceedings of the IEEE 2008 Custom Integrated Circuits Conference, CICC 2008, DoubleTree Hotel, San Jose, California, USA, September 21-24, 2008},
publisher = {IEEE},
isbn = {978-1-4244-2018-6},
}