Mask versus Schematic - an enhanced design-verification flow for first silicon success

Tseng-Chin Luo, Eric Leong, Mango Chia-Tso Chao, Philip A. Fisher, Wen-Hsiang Chang. Mask versus Schematic - an enhanced design-verification flow for first silicon success. In Ron Press, Erik H. Volkerink, editors, 2011 IEEE International Test Conference, ITC 2010, Austin, TX, USA, November 2-4, 2010. pages 369-377, IEEE, 2010. [doi]

Abstract

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