Electron-Beam Resists for Lift-Off Processing with Potential Application to Josephson Integrated Circuits

J. H. Magerlein, D. J. Webb. Electron-Beam Resists for Lift-Off Processing with Potential Application to Josephson Integrated Circuits. IBM Journal of Research and Development, 24(5):554-562, 1980. [doi]

Abstract

Abstract is missing.