EASE--An Application-Based CAD System for Process Design

J. Mar, Krish Bhargavan, Steven G. Duvall, Ram Firestone, Dennis J. Lucey, S. N. Nandgaonkar, S. Wu, Kaung-Shia Yu, F. Zarbakhsh. EASE--An Application-Based CAD System for Process Design. IEEE Trans. on CAD of Integrated Circuits and Systems, 6(6):1032-1038, 1987. [doi]

Abstract

Abstract is missing.