CMOS Compatible Pyroelectric Applications Enabled by Doped HfO2 Films on Deep-Trench Structures

C. Mart, Wenke Weinreich, M. Czernohorsky, Stefan Riedel, S. Zybell, K. Kuhnel. CMOS Compatible Pyroelectric Applications Enabled by Doped HfO2 Films on Deep-Trench Structures. In 48th European Solid-State Device Research Conference, ESSDERC 2018, Dresden, Germany, September 3-6, 2018. pages 130-133, IEEE, 2018. [doi]

Abstract

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