Yutaka Masuda, Jun Nagayama, TaiYu Cheng, Tohru Ishihara, Yoichi Momiyama, Masanori Hashimoto. Critical Path Isolation and Bit-Width Scaling Are Highly Compatible for Voltage Over-Scalable Design. In Design, Automation & Test in Europe Conference & Exhibition, DATE 2021, Grenoble, France, February 1-5, 2021. pages 1260-1265, IEEE, 2021. [doi]
@inproceedings{MasudaNCIMH21,
title = {Critical Path Isolation and Bit-Width Scaling Are Highly Compatible for Voltage Over-Scalable Design},
author = {Yutaka Masuda and Jun Nagayama and TaiYu Cheng and Tohru Ishihara and Yoichi Momiyama and Masanori Hashimoto},
year = {2021},
doi = {10.23919/DATE51398.2021.9473946},
url = {https://doi.org/10.23919/DATE51398.2021.9473946},
researchr = {https://researchr.org/publication/MasudaNCIMH21},
cites = {0},
citedby = {0},
pages = {1260-1265},
booktitle = {Design, Automation & Test in Europe Conference & Exhibition, DATE 2021, Grenoble, France, February 1-5, 2021},
publisher = {IEEE},
isbn = {978-3-9819263-5-4},
}