Yuichiro Mitani, Shigeto Fukatsu, D. Hagishima, K. Matsuzawa. Lifetime prediction of channel hot carrier degradation in pMOSFETs separating NBTI component. In IEEE International Conference on IC Design & Technology, ICICDT 2012, Austin, TX, USA, May 30 - June 1, 2012. pages 1-4, IEEE, 2012. [doi]
Abstract is missing.