Analysis of deep submicron VLSI technological risks: A new qualification process for professional electronics

F. Molière, B. Foucher, P. Perdu, A. Bravaix. Analysis of deep submicron VLSI technological risks: A new qualification process for professional electronics. Microelectronics Reliability, 49(9-11):1381-1385, 2009. [doi]

Authors

F. Molière

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B. Foucher

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P. Perdu

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A. Bravaix

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