F. Molière, B. Foucher, P. Perdu, A. Bravaix. Analysis of deep submicron VLSI technological risks: A new qualification process for professional electronics. Microelectronics Reliability, 49(9-11):1381-1385, 2009. [doi]
@article{MoliereFPB09,
title = {Analysis of deep submicron VLSI technological risks: A new qualification process for professional electronics},
author = {F. Molière and B. Foucher and P. Perdu and A. Bravaix},
year = {2009},
doi = {10.1016/j.microrel.2009.07.001},
url = {http://dx.doi.org/10.1016/j.microrel.2009.07.001},
tags = {analysis},
researchr = {https://researchr.org/publication/MoliereFPB09},
cites = {0},
citedby = {0},
journal = {Microelectronics Reliability},
volume = {49},
number = {9-11},
pages = {1381-1385},
}