Fast temperature cycling and electromigration induced thin film cracking in multilevel interconnection: experiments and modeling

H. V. Nguyen, Cora Salm, J. Vroemen, J. Voets, B. Krabbenborg, J. Bisschop, A. J. Mouthaan, Fred G. Kuper. Fast temperature cycling and electromigration induced thin film cracking in multilevel interconnection: experiments and modeling. Microelectronics Reliability, 42(9-11):1415-1420, 2002. [doi]

Abstract

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