Extending a 65nm CMOS process design kit for high total ionizing dose effects - researchr publication authors

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Aristeidis Nikolaou, Matthias Bucher, Nikos Makris, Alexia Papadopoulou, Loukas Chevas, Giulio Borghello, Henri D. Koch, Kostas Kloukinas, Tuomas S. Poikela, Federico Faccio. Extending a 65nm CMOS process design kit for high total ionizing dose effects. In 7th International Conference on Modern Circuits and Systems Technologies, MOCAST 2018, Thessaloniki, Greece, May 7-9, 2018. pages 1-4, IEEE, 2018. [doi]

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