Aristeidis Nikolaou, Matthias Bucher, Nikos Makris, Alexia Papadopoulou, Loukas Chevas, Giulio Borghello, Henri D. Koch, Kostas Kloukinas, Tuomas S. Poikela, Federico Faccio. Extending a 65nm CMOS process design kit for high total ionizing dose effects. In 7th International Conference on Modern Circuits and Systems Technologies, MOCAST 2018, Thessaloniki, Greece, May 7-9, 2018. pages 1-4, IEEE, 2018. [doi]
@inproceedings{NikolaouBMPCBKK18,
title = {Extending a 65nm CMOS process design kit for high total ionizing dose effects},
author = {Aristeidis Nikolaou and Matthias Bucher and Nikos Makris and Alexia Papadopoulou and Loukas Chevas and Giulio Borghello and Henri D. Koch and Kostas Kloukinas and Tuomas S. Poikela and Federico Faccio},
year = {2018},
doi = {10.1109/MOCAST.2018.8376561},
url = {https://doi.org/10.1109/MOCAST.2018.8376561},
researchr = {https://researchr.org/publication/NikolaouBMPCBKK18},
cites = {0},
citedby = {0},
pages = {1-4},
booktitle = {7th International Conference on Modern Circuits and Systems Technologies, MOCAST 2018, Thessaloniki, Greece, May 7-9, 2018},
publisher = {IEEE},
isbn = {978-1-5386-4788-2},
}