Extending a 65nm CMOS process design kit for high total ionizing dose effects

Aristeidis Nikolaou, Matthias Bucher, Nikos Makris, Alexia Papadopoulou, Loukas Chevas, Giulio Borghello, Henri D. Koch, Kostas Kloukinas, Tuomas S. Poikela, Federico Faccio. Extending a 65nm CMOS process design kit for high total ionizing dose effects. In 7th International Conference on Modern Circuits and Systems Technologies, MOCAST 2018, Thessaloniki, Greece, May 7-9, 2018. pages 1-4, IEEE, 2018. [doi]

Abstract

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