Shun'ichiro Ohmi, Yizhe Ding, Sohya Kudoh. Ultrathin HfN Multilayer Gate Insulator Formation with High Dielectric Constant Induced by Interface Polarization. In Device Research Conference, DRC 2019, Ann Arbor, MI, USA, June 23-26, 2019. pages 181-182, IEEE, 2019. [doi]
Abstract is missing.