An evaluation of the impact of gate oxide tunneling on dual-::::V::t::::::-based leakage reduction techniques

Lara D. Oliver, Krishnendu Chakrabarty, Hisham Z. Massoud. An evaluation of the impact of gate oxide tunneling on dual-::::V::t::::::-based leakage reduction techniques. In Gang Qu, Yehea I. Ismail, Narayanan Vijaykrishnan, Hai Zhou, editors, Proceedings of the 16th ACM Great Lakes Symposium on VLSI 2006, Philadelphia, PA, USA, April 30 - May 1, 2006. pages 105-110, ACM, 2006. [doi]

Abstract

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