Improved low-frequency noise for 0.3nm EOT thulium silicate interfacial layer

Maryam Olyaei, B. Gunnar Malm, Eugenio Dentoni Litta, Per-Erik Hellstrom, Mikael Östling. Improved low-frequency noise for 0.3nm EOT thulium silicate interfacial layer. In 44th European Solid State Device Research Conference, ESSDERC 2014, Venice Lido, Italy, September 22-26, 2014. pages 361-364, IEEE, 2014. [doi]

Abstract

Abstract is missing.