DTCO for DSA-MP Hybrid Lithography with Double-BCP Materials in Sub-7nm Node - researchr publication authors

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Jiaojiao Ou, Xiaoqing Xu, Brian Cline, Greg Yeric, David Z. Pan. DTCO for DSA-MP Hybrid Lithography with Double-BCP Materials in Sub-7nm Node. In 2017 IEEE International Conference on Computer Design, ICCD 2017, Boston, MA, USA, November 5-8, 2017. pages 403-410, IEEE Computer Society, 2017. [doi]

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