Flare reduction in EUV Lithography by perturbation of wire segments - researchr publication authors

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Sudipta Paul, Pritha Banerjee, Susmita Sur-Kolay. Flare reduction in EUV Lithography by perturbation of wire segments. In 2015 IFIP/IEEE International Conference on Very Large Scale Integration, VLSI-SoC 2015, Daejeon, South Korea, October 5-7, 2015. pages 7-12, IEEE, 2015. [doi]

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