Sudipta Paul, Pritha Banerjee, Susmita Sur-Kolay. Flare reduction in EUV Lithography by perturbation of wire segments. In 2015 IFIP/IEEE International Conference on Very Large Scale Integration, VLSI-SoC 2015, Daejeon, South Korea, October 5-7, 2015. pages 7-12, IEEE, 2015. [doi]
@inproceedings{PaulBS15,
title = {Flare reduction in EUV Lithography by perturbation of wire segments},
author = {Sudipta Paul and Pritha Banerjee and Susmita Sur-Kolay},
year = {2015},
doi = {10.1109/VLSI-SoC.2015.7314383},
url = {http://dx.doi.org/10.1109/VLSI-SoC.2015.7314383},
researchr = {https://researchr.org/publication/PaulBS15},
cites = {0},
citedby = {0},
pages = {7-12},
booktitle = {2015 IFIP/IEEE International Conference on Very Large Scale Integration, VLSI-SoC 2015, Daejeon, South Korea, October 5-7, 2015},
publisher = {IEEE},
isbn = {978-1-4673-9140-5},
}