Mismatch analysis and statistical design at 65 nm and below

Larry T. Pileggi, Gökçe Keskin, Xin Li, Ken Mai, Jonathan Proesel. Mismatch analysis and statistical design at 65 nm and below. In Proceedings of the IEEE 2008 Custom Integrated Circuits Conference, CICC 2008, DoubleTree Hotel, San Jose, California, USA, September 21-24, 2008. pages 9-12, IEEE, 2008. [doi]

Abstract

Abstract is missing.