Nanometer-scale leakage measurements in high vacuum on de-processed high-k capacitors

W. Polspoel, Wilfried Vandervorst, L. Aguilera, M. Porti, M. Nafría, X. Aymerich. Nanometer-scale leakage measurements in high vacuum on de-processed high-k capacitors. Microelectronics Reliability, 48(8-9):1521-1524, 2008. [doi]

@article{PolspoelVAPNA08,
  title = {Nanometer-scale leakage measurements in high vacuum on de-processed high-k capacitors},
  author = {W. Polspoel and Wilfried Vandervorst and L. Aguilera and M. Porti and M. Nafría and X. Aymerich},
  year = {2008},
  doi = {10.1016/j.microrel.2008.07.026},
  url = {http://dx.doi.org/10.1016/j.microrel.2008.07.026},
  researchr = {https://researchr.org/publication/PolspoelVAPNA08},
  cites = {0},
  citedby = {0},
  journal = {Microelectronics Reliability},
  volume = {48},
  number = {8-9},
  pages = {1521-1524},
}