Characterization of charge trapping in SiO::2::/Al::2::O::3:: dielectric stacks by pulsed C-V technique - researchr publication authors

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Giuseppina Puzzilli, Bogdan Govoreanu, Fernanda Irrera, Maarten Rosmeulen, Jan Van Houdt. Characterization of charge trapping in SiO::2::/Al::2::O::3:: dielectric stacks by pulsed C-V technique. Microelectronics Reliability, 47(4-5):508-512, 2007. [doi]

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