U. Rana, D. P. Brunco, S. Raman, Dina H. Triyoso, M. W. Stoker, J. B. Johnson, Luigi Pantisano, K. D. Seo, M. Zhao, A. Reznicek, R. Krishnan, B. Moser, J. Freeman, L. Jang, E. Kaganer. High Performance and Yield for Super Steep Retrograde Wells (SSRW) by Well Implant / Si-based Epitaxy on Advanced Technology FinFETs. In Device Research Conference, DRC 2019, Ann Arbor, MI, USA, June 23-26, 2019. pages 251-252, IEEE, 2019. [doi]
Abstract is missing.