Blocking Oxide Material Engineering to Improve Retention Loss in 3D NAND: a Modeling Process Optimization Study

Tommaso Rollo, Hansel Lo, Luca Larcher, Christopher Olsen, Milan Pesic. Blocking Oxide Material Engineering to Improve Retention Loss in 3D NAND: a Modeling Process Optimization Study. In IEEE International Reliability Physics Symposium, IRPS 2024, Grapevine, TX, USA, April 14-18, 2024. pages 1-5, IEEE, 2024. [doi]

@inproceedings{RolloLLOP24,
  title = {Blocking Oxide Material Engineering to Improve Retention Loss in 3D NAND: a Modeling Process Optimization Study},
  author = {Tommaso Rollo and Hansel Lo and Luca Larcher and Christopher Olsen and Milan Pesic},
  year = {2024},
  doi = {10.1109/IRPS48228.2024.10529303},
  url = {https://doi.org/10.1109/IRPS48228.2024.10529303},
  researchr = {https://researchr.org/publication/RolloLLOP24},
  cites = {0},
  citedby = {0},
  pages = {1-5},
  booktitle = {IEEE International Reliability Physics Symposium, IRPS 2024, Grapevine, TX, USA, April 14-18, 2024},
  publisher = {IEEE},
  isbn = {979-8-3503-6976-2},
}