Mixture of negative bias temperature instability and hot-carrier driven threshold voltage degradation of 130 nm technology p-channel transistors - researchr publication authors

researchr

You are not signed in
Sign in
Sign up

Gunnar Andreas Rott, Karina Rott, Hans Reisinger, Wolfgang Gustin, Tibor Grasser. Mixture of negative bias temperature instability and hot-carrier driven threshold voltage degradation of 130 nm technology p-channel transistors. Microelectronics Reliability, 54(9-10):2310-2314, 2014. [doi]

This author has not been identified. Look up 'Gunnar Andreas Rott' in GoogleThis author has not been identified. Look up 'Karina Rott' in GoogleThis author has not been identified. Look up 'Hans Reisinger' in GoogleThis author has not been identified. Look up 'Wolfgang Gustin' in GoogleThis author has not been identified. Look up 'Tibor Grasser' in Google

runs on WebDSL