Electromigration in width transition copper interconnect

Arijit Roy, Yuejin Hou, Cher Ming Tan. Electromigration in width transition copper interconnect. Microelectronics Reliability, 49(9-11):1086-1089, 2009. [doi]

Authors

Arijit Roy

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Yuejin Hou

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Cher Ming Tan

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