Stitch-avoiding Detailed Routing for Multiple E-Beam Lithography

Kritanta Saha, Pritha Banerjee, Susmita Sur-Kolay. Stitch-avoiding Detailed Routing for Multiple E-Beam Lithography. In 30th IFIP/IEEE 30th International Conference on Very Large Scale Integration, VLSI-SoC 2022, Patras, Greece, October 3-5, 2022. pages 1-6, IEEE, 2022. [doi]

Abstract

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