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Strontium doped hafnium oxide thin films: Wide process window for ferroelectric memories

T. Schenk, S. Mueller, U. Schroeder, R. Materlik, A. Kersch, M. Popovici, C. Adelmann, S. Van Elshocht, T. Mikolajick. Strontium doped hafnium oxide thin films: Wide process window for ferroelectric memories. In Proceedings of the European Solid-State Device Research Conference, ESSDERC 2013, Bucharest, Romania, September 16-20, 2013. pages 260-263, IEEE, 2013. [doi]

Authors

T. Schenk

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S. Mueller

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U. Schroeder

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R. Materlik

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A. Kersch

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M. Popovici

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C. Adelmann

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S. Van Elshocht

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T. Mikolajick

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