T. Schenk, S. Mueller, U. Schroeder, R. Materlik, A. Kersch, M. Popovici, C. Adelmann, S. Van Elshocht, T. Mikolajick. Strontium doped hafnium oxide thin films: Wide process window for ferroelectric memories. In Proceedings of the European Solid-State Device Research Conference, ESSDERC 2013, Bucharest, Romania, September 16-20, 2013. pages 260-263, IEEE, 2013. [doi]
@inproceedings{SchenkMSMKPAEM13,
title = {Strontium doped hafnium oxide thin films: Wide process window for ferroelectric memories},
author = {T. Schenk and S. Mueller and U. Schroeder and R. Materlik and A. Kersch and M. Popovici and C. Adelmann and S. Van Elshocht and T. Mikolajick},
year = {2013},
doi = {10.1109/ESSDERC.2013.6818868},
url = {http://dx.doi.org/10.1109/ESSDERC.2013.6818868},
researchr = {https://researchr.org/publication/SchenkMSMKPAEM13},
cites = {0},
citedby = {0},
pages = {260-263},
booktitle = {Proceedings of the European Solid-State Device Research Conference, ESSDERC 2013, Bucharest, Romania, September 16-20, 2013},
publisher = {IEEE},
}