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Effects of aluminum incorporation on hafnium oxide film using plasma immersion ion implantation

Banani Sen, B. L. Yang, Hei Wong, C. W. Kok, P. K. Chu, A. Huang. Effects of aluminum incorporation on hafnium oxide film using plasma immersion ion implantation. Microelectronics Reliability, 48(11-12):1765-1768, 2008. [doi]

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Banani Sen

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B. L. Yang

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Hei Wong

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C. W. Kok

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P. K. Chu

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A. Huang

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