The following publications are possibly variants of this publication:
- Non-ideal effects improvement of SF::6:: plasma treated hafnium oxide film based on electrolyte-insulator-semiconductor structure for pH-sensor applicationTseng-Fu Lu, Jer-Chyi Wang, Chia-Ming Yang, Chung-Po Chang, Kuan-I Ho, Chi-Fong Ai, Chao Sung Lai. mr, 50(5):742-746, 2010. [doi]
- Total ionizing dose effects on aluminum oxide/zirconium-doped hafnium oxide stack ferroelectric tunneling junctionsXueqin Yang, Yannan Xu, Jinshun Bi, Kai Xi, Linjie Fan, Lanlong Ji, Gaobo Xu. chinaf, 65(6):1-2, 2022. [doi]