Banani Sen, B. L. Yang, Hei Wong, C. W. Kok, P. K. Chu, A. Huang. Effects of aluminum incorporation on hafnium oxide film using plasma immersion ion implantation. Microelectronics Reliability, 48(11-12):1765-1768, 2008. [doi]
@article{SenYWKCH08,
title = {Effects of aluminum incorporation on hafnium oxide film using plasma immersion ion implantation},
author = {Banani Sen and B. L. Yang and Hei Wong and C. W. Kok and P. K. Chu and A. Huang},
year = {2008},
doi = {10.1016/j.microrel.2008.07.069},
url = {http://dx.doi.org/10.1016/j.microrel.2008.07.069},
tags = {C++},
researchr = {https://researchr.org/publication/SenYWKCH08},
cites = {0},
citedby = {0},
journal = {Microelectronics Reliability},
volume = {48},
number = {11-12},
pages = {1765-1768},
}