Influence of SiC epitaxial wafer quality on yield of 1.2kV SiC-DMOSFETs

Junji Senzaki, Ryoji Kosugi, Keiko Masumoto, Takeshi Mitani, Takeharu Kuroiwa, Hiroshi Yamaguchi. Influence of SiC epitaxial wafer quality on yield of 1.2kV SiC-DMOSFETs. In IEEE International Reliability Physics Symposium, IRPS 2022, Dallas, TX, USA, March 27-31, 2022. pages 63-1, IEEE, 2022. [doi]

@inproceedings{SenzakiKMMKY22,
  title = {Influence of SiC epitaxial wafer quality on yield of 1.2kV SiC-DMOSFETs},
  author = {Junji Senzaki and Ryoji Kosugi and Keiko Masumoto and Takeshi Mitani and Takeharu Kuroiwa and Hiroshi Yamaguchi},
  year = {2022},
  doi = {10.1109/IRPS48227.2022.9764475},
  url = {https://doi.org/10.1109/IRPS48227.2022.9764475},
  researchr = {https://researchr.org/publication/SenzakiKMMKY22},
  cites = {0},
  citedby = {0},
  pages = {63},
  booktitle = {IEEE International Reliability Physics Symposium, IRPS 2022, Dallas, TX, USA, March 27-31, 2022},
  publisher = {IEEE},
  isbn = {978-1-6654-7950-9},
}