Keeping Deep Lithography Simulators Updated: Global-Local Shape-Based Novelty Detection and Active Learning

Hao-Chiang Shao, Hsing-Lei Ping, Kuo-Shiuan Chen, Weng-Tai Su, Chia-Wen Lin, Shao-Yun Fang, Pin-Yian Tsai, Yan-Hsiu Liu. Keeping Deep Lithography Simulators Updated: Global-Local Shape-Based Novelty Detection and Active Learning. IEEE Trans. on CAD of Integrated Circuits and Systems, 42(3):1000-1014, March 2023. [doi]

Abstract

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