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Characteristics of Ni/AlOx/Pt RRAM devices with various dielectric fabrication temperatures

Zong Jie Shen, Chun Zhao, C. Z. Zhao, Ivona Z. Mitrovic, Li Yang, W. Y. Xu, Eng Gee Lim, T. Luo, Y. B. Huang. Characteristics of Ni/AlOx/Pt RRAM devices with various dielectric fabrication temperatures. In International Conference on IC Design and Technology, ICICDT 2019, Suzhou, China, June 17-19, 2019. pages 1-4, IEEE, 2019. [doi]

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Zong Jie Shen

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Chun Zhao

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C. Z. Zhao

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Ivona Z. Mitrovic

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Li Yang

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W. Y. Xu

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Eng Gee Lim

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T. Luo

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Y. B. Huang

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